Literature DB >> 22482928

Vapor-solid growth of few-layer graphene using radio frequency sputtering deposition and its application on field emission.

Jian-hua Deng1, Rui-ting Zheng, Yong Zhao, Guo-an Cheng.   

Abstract

The carbon nanotube (CNT) and graphene hybrid is an attractive candidate for field emission (FE) because of its unique properties, such as high conductivity, large aspect ratio of CNT, and numerous sharp edges of graphene. We report here a vapor-solid growth of few-layer graphene (FLG, less than 10 layers) on CNTs (FLG/CNT) and Si wafers using a radio frequency sputtering deposition system. Based on SEM, TEM, and Raman spectrum analyses, a defect nucleation mechanism of the FLG growth was proposed. The FE measurements indicate that the FLG/CNT hybrids have low turn-on (0.956 V/μm) and threshold fields (1.497 V/μm), large field enhancement factor (∼4398), and good stability. Excellent FE properties of the FLG/CNT hybrids make them attractive candidates as high-performance field emitters.

Entities:  

Year:  2012        PMID: 22482928     DOI: 10.1021/nn300900v

Source DB:  PubMed          Journal:  ACS Nano        ISSN: 1936-0851            Impact factor:   15.881


  3 in total

1.  Growth promotion of vertical graphene on SiO2/Si by Ar plasma process in plasma-enhanced chemical vapor deposition.

Authors:  Yanping Sui; Zhiying Chen; Yanhui Zhang; Shike Hu; Yijian Liang; Xiaoming Ge; Jing Li; Guanghui Yu; Songang Peng; Zhi Jin; Xinyu Liu
Journal:  RSC Adv       Date:  2018-05-22       Impact factor: 4.036

2.  Effect of vertically oriented few-layer graphene on the wettability and interfacial reactions of the AgCuTi-SiO2f/SiO2 system.

Authors:  Z Sun; L X Zhang; J L Qi; Z H Zhang; T D Hao; J C Feng
Journal:  Sci Rep       Date:  2017-03-22       Impact factor: 4.379

3.  Insights into the Mechanism for Vertical Graphene Growth by Plasma-Enhanced Chemical Vapor Deposition.

Authors:  Jie Sun; Tanupong Rattanasawatesun; Penghao Tang; Zhaoxia Bi; Santosh Pandit; Lisa Lam; Caroline Wasén; Malin Erlandsson; Maria Bokarewa; Jichen Dong; Feng Ding; Fangzhu Xiong; Ivan Mijakovic
Journal:  ACS Appl Mater Interfaces       Date:  2022-01-10       Impact factor: 9.229

  3 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.