| Literature DB >> 22353250 |
Muhammad Yousuf Soomro1, Ijaz Hussain, Nargis Bano, Esteban Broitman, Omer Nur, Magnus Willander.
Abstract
We measure the elastic modulus of a single horizontal ZnO nanorod [NR] grown by a low-temperature hydrothermal chemical process on silicon substrates by performing room-temperature, direct load-controlled nanoindentation measurements. The configuration of the experiment for the single ZnO NR was achieved using a focused ion beam/scanning electron microscope dual-beam instrument. The single ZnO NR was positioned horizontally over a hole on a silicon wafer using a nanomanipulator, and both ends were bonded with platinum, defining a three-point bending configuration. The elastic modulus of the ZnO NR, extracted from the unloading curve using the well-known Oliver-Pharr method, resulted in a value of approximately 800 GPa. Also, we discuss the NR creep mechanism observed under indentation. The mechanical behavior reported in this paper will be a useful reference for the design and applications of future nanodevices.Entities:
Year: 2012 PMID: 22353250 PMCID: PMC3298492 DOI: 10.1186/1556-276X-7-146
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Figure 1SEM image showing the morphology of the as-grown ZnO NR arrays grown on silicon substrate. Inset shows a magnified image.
Figure 2SEM image showing morphology of as-grown ZnO NR arrays grown on silicon substrate (side view).
Figure 3Schematic diagram of a single ZnO NR. Schematic diagram of a single ZnO NR with fixed ends placed at the trenched zone on the silicon wafer substrate. Inset shows a SEM image of typical suspended NRs on the silicon wafer substrate. The white particles are the residue of broken ZnO NRs.
Figure 4Nanoindentation load-displacement curve. Nanoindentation load-displacement curve with a peak indentation load-holding segment, showing creep at the peak load. The inset shows load-time profile.