| Literature DB >> 22323275 |
Joachim Fischer1, Martin Wegener.
Abstract
To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.Entities:
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Year: 2012 PMID: 22323275 DOI: 10.1002/adma.201103758
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849