| Literature DB >> 22297354 |
Aitor V Velasco1, María L Calvo, Pavel Cheben, Alejandro Ortega-Moñux, Jens H Schmid, Carlos Alonso Ramos, Iñigo Molina Fernandez, Jean Lapointe, Martin Vachon, Siegfried Janz, Dan-Xia Xu.
Abstract
The design and fabrication of an ultracompact silicon-on-insulator polarization converter is reported. The polarization conversion with an extinction ratio of 16 dB is achieved for a conversion length of only 10 μm. Polarization rotation is achieved by inducing a vertical asymmetry by forming in the waveguide core two subwavelength trenches of different depths. By taking advantage of the calibrated reactive ion etch lag, the two depths are implemented using a single mask and etching process. The measured converter loss is -0.7 dB and the 3 dB bandwidth is 26 nm.Entities:
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Year: 2012 PMID: 22297354 DOI: 10.1364/OL.37.000365
Source DB: PubMed Journal: Opt Lett ISSN: 0146-9592 Impact factor: 3.776