| Literature DB >> 22286331 |
Frederik Goethals1, Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier, Pascal Van der Voort, Isabel Van Driessche.
Abstract
A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane. This journal is © The Royal Society of Chemistry 2012Entities:
Year: 2012 PMID: 22286331 DOI: 10.1039/c2cc18017k
Source DB: PubMed Journal: Chem Commun (Camb) ISSN: 1359-7345 Impact factor: 6.222