Water-developable poly(2-oxazoline)-based negative photoresists.

Copoly(2-oxazoline)-based photoresists are prepared from pEtOx(80) Bu(=) Ox(20) and pPhOx(80) Dc(=) Ox(20) , respectively, a tetrathiol, and a photosensitive initiator. It is possible to prepare copoly(2-oxazoline)s bearing unsaturated side chains in a microwave reactor on a decagram scale in reaction times of 100 min or shorter. UV irradiation of dried polymer films through a quartz mask induces the thiol-ene reaction in the illuminated areas. Subsequent development of the polymer films in halogen-free solvents reproduces the negative pattern of the mask with a resolution of 2 μm. The pEtOx(80) Bu(=) Ox(20) -derived photoresists can also be developed in water.