| Literature DB >> 22221446 |
Wontae Hwang1, Guoqing Xin, Minjun Cho, Sung Min Cho, Heeyeop Chae.
Abstract
Electrospray process was developed for organic layer deposition onto polymer organic light-emitting diode [PLED] devices in this work. An electrospray can be used to produce nanometer-scale thin films by electric repulsion of microscale fine droplets. PLED devices made by an electrospray process were compared with spin-coated ones. The PLED device fabricated by the electrospray process showed maximum current efficiency of 24 cd/A, which was comparable with that of the spin-coating process. The electrospray process required a higher concentration of hole and electron transport materials in the inks than spin-coating processes to achieve PLED maximum performance. Photoluminescence [PL] at 407 nm was observed using electrosprayed poly(N-vinyl carbazole) films, whereas a peak at 410 nm was observed with the spin-coated ones. Similar difference in peak position was observed between aromatic and nonaromatic solvents in the spin-coating process. PLED devices made by the electrospray process showed lower current density than that of spin-coated ones. The PL peak shift and reduced current of electrosprayed films can therefore be attributed to the conformation of the polymer.Entities:
Year: 2012 PMID: 22221446 PMCID: PMC3275458 DOI: 10.1186/1556-276X-7-52
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Ratio of the PLED ink
| PVK | 61 | 41.5 |
| PBD | 24 | 41.5 |
| TPD | 9 | 14.8 |
| Ir(mppy) | 6 | 4.2 |
aEach figure means weight percent of materials in the solution, and the main difference between Ink 1 and Ink 2 is the ratio of hole and electron transport materials. PVK, poly(N-vinyl carbazole); PBD, 2-(4-biphenylyl)-5-(4-tert-butylphenyl)-1, 3, 4-oxadiazole; TPD, N, N'diphenyl-N, N'-Bis(3-methylphenyl)-[1, 1-biphenyl]-4, 4'-diamine; Ir(mppy)3, tris(2-(4-tolyl) phenylpyridine) iridium.
Figure 1Schematic description of the electrospray process used for PLED fabrication.
Figure 2PVK film thickness and roughness as a function of deposition time.
Figure 3Device performance of the devices made by spin-coating or electrospraying. The thicknesses of EML were as follows: (1) 78, (2) 100, (3) 120, (4) 70, (5) 100, and (6) 103 nm.
Summary of device performances
| Device | Process | Ink | Solvent | EML | Cd/A | Lm/W |
|---|---|---|---|---|---|---|
| 1 | Spin-coating | Ink 1 | CB | 78 | 24 | 10 |
| 2 | Electrospray | Ink 1 | CB/DCB (5:3) | 100 | 15 | 6 |
| 3 | Electrospray | Ink 1 | CB/DCB (5:3) | 120 | 18 | 6.6 |
| 4 | Electrospray | Ink 2 | CB/DCB (5:3) | 70 | 18 | 7.5 |
| 5 | Electrospray | Ink 2 | CB/DCB (5:3) | 100 | 24 | 9.2 |
| 6 | Electrospray | Ink 2 | CB/DCB (1:1) | 103 | 23 | 8.6 |
EML, emissive layer; CB, chlorobenzene; DCB, dichlorobenzene.
Figure 4PL spectra of PVK films spin-coated or electrosprayed from the solvents (CB/DCB, DCE, or CF). (a) Normal view. (b) Enlarged view of (a). All spectra are normalized to their maximum value, and the excitation wavelength was fixed at 335 nm.
Figure 5Current density-voltage curve of PVK devices using spin-coating and electrospray deposition (ITO/PEDOT:PSS/PVK/CsF/Al). The thin films using CB/DCB showed a better current density under the same conditions.