Literature DB >> 22173287

Electronic bipolar resistance switching in an anti-serially connected Pt/TiO2/Pt structure for improved reliability.

Kyung Min Kim1, Seungwu Han, Cheol Seong Hwang.   

Abstract

Electronic bipolar resistive switching and its degradation in the Pt/TiO2/Pt structure were studied. The electronic bipolar switching was induced from the asymmetric trap distribution of the structure under its unipolar reset state. The imbalanced migration of oxygen accompanied by electronic switching significantly degrades switching endurance. Instead, the anti-serial connection of Pt/TiO2/Pt cells resulted in substantial improvements in endurance, underscoring the importance of vacancy migration in device reliability. In addition, the independent control of resistance states of the two connected cells provides the freedom to control resistance ratio, switching direction, and reliability.

Entities:  

Year:  2011        PMID: 22173287     DOI: 10.1088/0957-4484/23/3/035201

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  5 in total

1.  Dual conical conducting filament model in resistance switching TiO2 thin films.

Authors:  Kyung Min Kim; Tae Hyung Park; Cheol Seong Hwang
Journal:  Sci Rep       Date:  2015-01-19       Impact factor: 4.379

2.  Voltage divider effect for the improvement of variability and endurance of TaO(x) memristor.

Authors:  Kyung Min Kim; J Joshua Yang; John Paul Strachan; Emmanuelle Merced Grafals; Ning Ge; Noraica Davila Melendez; Zhiyong Li; R Stanley Williams
Journal:  Sci Rep       Date:  2016-02-02       Impact factor: 4.379

3.  Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures.

Authors:  Hao Jiang; Xiang Yuan Li; Ran Chen; Xing Long Shao; Jung Ho Yoon; Xiwen Hu; Cheol Seong Hwang; Jinshi Zhao
Journal:  Sci Rep       Date:  2016-02-26       Impact factor: 4.379

4.  Investigation of a memory effect in a Au/(Ti-Cu)Ox-gradient thin film/TiAlV structure.

Authors:  Damian Wojcieszak; Jarosław Domaradzki; Michał Mazur; Tomasz Kotwica; Danuta Kaczmarek
Journal:  Beilstein J Nanotechnol       Date:  2022-02-24       Impact factor: 3.649

5.  Effect of concurrent joule heat and charge trapping on RESET for NbAlO fabricated by atomic layer deposition.

Authors:  Peng Zhou; Li Ye; Qing Qing Sun; Peng Fei Wang; An Quan Jiang; Shi Jin Ding; David Wei Zhang
Journal:  Nanoscale Res Lett       Date:  2013-02-19       Impact factor: 4.703

  5 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.