Large-scale controllable patterning growth of aligned organic nanowires through evaporation-induced self-assembly.

Organic one-dimensional nanostructures are attractive building blocks for electronic, optoelectronic, and photonic applications. Achieving aligned organic nanowire arrays that can be patterned on a surface with well-controlled spatial arrangement is highly desirable in the fabrication of high-performance organic devices. We demonstrate a facile one-step method for large-scale controllable patterning growth of ordered single-crystal C(60) nanowires through evaporation-induced self-assembly. The patterning geometry of the nanowire arrays can be tuned by the shape of the covering hats of the confined curve-on-flat geometry. The formation of the pattern arrays is driven by a simple solvent evaporation process, which is controlled by the surface tension of the substrate (glass or Si) and geometry of the evaporation surface. By sandwiching a solvent pool between the substrate and a covering hat, the evaporation surface is confined to along the edge of the solvent pool. The geometry of the formed nanowire pattern is well defined by a surface-tension model of the evaporation channel. This simple method is further established as a general approach that is applicable to two other organic nanostructure systems. The I-V characteristics of such a parallel, organic, nanowire-array device was measured. The results demonstrate that the proposed method for direct growth of nanomaterials on a substrate is a feasible approach to device fabrication, especially to the fabrication of the parallel arrays of devices.