Literature DB >> 22148811

Organometallic chemical vapor deposition of III/V compound semiconductors with novel organometallic precursors.

A H Cowley, B L Benac, J G Ekerdt, R A Jones, K B Kidd, J Y Lee, J E Miller.   

Abstract

Year:  1988        PMID： 22148811     DOI： 10.1021/ja00226a051

Source DB:  PubMed          Journal:  J Am Chem Soc        ISSN： 0002-7863            Impact factor:   15.419


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  1 in total

1.  A single-source precursor approach to solution processed indium arsenide thin films.

Authors:  Peter Marchand; Sanjayan Sathasivam; Benjamin A D Williamson; David Pugh; Salem M Bawaked; Sulaiman N Basahel; Abdullah Y Obaid; David O Scanlon; Ivan P Parkin; Claire J Carmalt
Journal:  J Mater Chem C Mater       Date:  2016-06-23       Impact factor: 7.393
  1 in total

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