| Literature DB >> 22127892 |
Kimin Jun1, Yun Seog Lee, Tonio Buonassisi, Joseph M Jacobson.
Abstract
Silicon splits: The application of silicon to water oxidation is limited due to unfavorable interface properties. However, these can be circumvented by using a high-performance silicon photoanode with a catalytically active iron oxide thin film (see picture). This approach results in photocurrents as high as 17 mA cm(-2) under 1 sun and zero overpotential conditions.Entities:
Year: 2011 PMID： 22127892 DOI： 10.1002/anie.201104367
Source DB: PubMed Journal: Angew Chem Int Ed Engl ISSN： 1433-7851 Impact factor: 15.336