| Literature DB >> 22116790 |
Ji Xu1, Sung Woo Hong, Weiyin Gu, Kim Y Lee, David S Kuo, Shuaigang Xiao, Thomas P Russell.
Abstract
The combination of solvent annealing, surface reconstruction, and a tone-reversal etching procedure provides an attractive approach to utilize block copolymer (BCP) lithography to fabricate highly ordered and densely packed silicon oxide nano-dots on a surface. The obtained silicon oxide nano-dots feature an areal density of 1.3 teradots inch(-2) .Entities:
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Year: 2011 PMID: 22116790 DOI: 10.1002/adma.201102964
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849