| Literature DB >> 22065427 |
Feng Miao1, John Paul Strachan, J Joshua Yang, Min-Xian Zhang, Ilan Goldfarb, Antonio C Torrezan, Peter Eschbach, Ronald D Kelley, Gilberto Medeiros-Ribeiro, R Stanley Williams.
Abstract
By employing a precise method for locating and directly imaging the active switching region in a resistive random access memory (RRAM) device, a nanoscale conducting channel consisting of an amorphous Ta(O) solid solution surrounded by nearly stoichiometric Ta(2) O(5) is observed. Structural and chemical analysis of the channel combined with temperature-dependent transport measurements indicate a unique resistance switching mechanism.Mesh:
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Year: 2011 PMID: 22065427 DOI: 10.1002/adma.201103379
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849