Literature DB >> 21997566

Tungsten oxide as a gate dielectric for highly transparent and temperature-stable zinc-oxide-based thin-film transistors.

Michael Lorenz1, Holger von Wenckstern, Marius Grundmann.   

Abstract

Tungsten oxide is currently used as gate insulator in pH-sensing ion-sensitive field-effect transistors (ISFETs) and in electrochromic devices. Its great potential as a high-κ dielectric with high transparency and temperature stability is reported. Owing to the low gate voltage sweep necessary to turn the transistor on and off, a possible application could be as a low-voltage pixel driver in active-matrix displays in harsh environments.
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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Year:  2011        PMID: 21997566     DOI: 10.1002/adma.201103087

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


  2 in total

1.  Sub-25 nm Inorganic and Dielectric Nanopattern Arrays on Substrates: A Block Copolymer-Assisted Lithography.

Authors:  Tandra Ghoshal; Nadezda Prochukhan; Michael A Morris
Journal:  ACS Omega       Date:  2021-12-16

2.  Local atomic structure modulations activate metal oxide as electrocatalyst for hydrogen evolution in acidic water.

Authors:  Yu Hang Li; Peng Fei Liu; Lin Feng Pan; Hai Feng Wang; Zhen Zhong Yang; Li Rong Zheng; P Hu; Hui Jun Zhao; Lin Gu; Hua Gui Yang
Journal:  Nat Commun       Date:  2015-08-19       Impact factor: 14.919

  2 in total

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