Literature DB >> 21934775

Low-loss Si3N4 arrayed-waveguide grating (de)multiplexer using nano-core optical waveguides.

Daoxin Dai1, Zhi Wang, Jared F Bauters, M-C Tien, Martijn J R Heck, Daniel J Blumenthal, John E Bowers.   

Abstract

A 16-channel 200 GHz arrayed-waveguide grating (AWG) (de)-multiplexer is demonstrated experimentally by utilizing Si3N4 buried optical waveguides, which have 50 nm-thick Si3N4 cores and a 15 μm-thick SiO2 cladding. The structure with an ultra-thin core layer helps to reduce the scattering due to the sidewall roughness and consequently shows very low loss of about 0.4~0.8 dB/m. When using this type of optical waveguide for an AWG (de)multiplexer, there is no problem associated with gap refill using the upper-cladding material even when choosing a small (e.g., 1.0 μm) gap between adjacent arrayed waveguides, which helps to reduce the transition loss between the FPR (free-propagation region) and the arrayed waveguides. Therefore, the demonstrated AWG (de)multiplexer based on the present Si3N4 buried optical waveguides has a low on-chip loss. The fabricated AWG (de)multiplexer is characterized in two wavelength ranges around 1310 nm and 1550 nm, respectively. It shows that the crosstalk from adjacent and non-adjacent channels are about -30 dB, and -40 dB, respectively, at the wavelength range of 1310 nm. The Si3N4 AWG (de)multiplexer has a temperature dependence of about 0.011 nm/°C, which is close to that of a pure SiO2 AWG device.

Entities:  

Year:  2011        PMID: 21934775     DOI: 10.1364/OE.19.014130

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  2 in total

1.  Integrated spatial multiplexing of heralded single-photon sources.

Authors:  M J Collins; C Xiong; I H Rey; T D Vo; J He; S Shahnia; C Reardon; T F Krauss; M J Steel; A S Clark; B J Eggleton
Journal:  Nat Commun       Date:  2013       Impact factor: 14.919

2.  A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk wafer.

Authors:  Ziyi Zhang; Motoki Yako; Kan Ju; Naoyuki Kawai; Papichaya Chaisakul; Tai Tsuchizawa; Makoto Hikita; Koji Yamada; Yasuhiko Ishikawa; Kazumi Wada
Journal:  Sci Technol Adv Mater       Date:  2017-04-13       Impact factor: 8.090

  2 in total

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