Literature DB >> 21868159

Analysis of supercritical water oxidation for detoxification of waste organic solvent in university based on life cycle assessment.

Yasunori Kikuchi1, Kohjiro Kurata, Jun Nakatani, Masahiko Hirao, Yoshito Oshima.   

Abstract

Spray incineration and supercritical water oxidation (SCWO) processes have been used for detoxifying waste organic fluids in the University of Tokyo. In this study, we aim to elucidate the environmental aspects of these waste treatment processes by life cycle assessment (LCA). Through the investigation of actual plants, the inventory data and other characteristics of actual plants were collected and analyzed. To confirm the potential of SCWO, three modification types of the process and operation were considered and assessed on the basis of estimated inventory data. The results demonstrate that spray incineration has less environmental impact than SCWO in all scenarios. However, SCWO has various advantages for installation as a treatment process in universities such as negligible risk of creating dioxins and particulate matter. Proper choice of the treatment method for organic waste fluid requires a comprehensive analysis of risks. Spray incineration poses the risk of providing dioxins and particulate matter, while SCWO has such risk at negligible level. This means that waste including concerned materials related to such emission should be treated by SCWO. Using the right technologies for the right tasks in the detoxification of hazardous materials should be implemented for sustainable universities.
Copyright © 2011 Elsevier B.V. All rights reserved.

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Year:  2011        PMID: 21868159     DOI: 10.1016/j.jhazmat.2011.07.107

Source DB:  PubMed          Journal:  J Hazard Mater        ISSN: 0304-3894            Impact factor:   10.588


  2 in total

1.  Physical and chemical mechanisms in oxide-based resistance random access memory.

Authors:  Kuan-Chang Chang; Ting-Chang Chang; Tsung-Ming Tsai; Rui Zhang; Ya-Chi Hung; Yong-En Syu; Yao-Feng Chang; Min-Chen Chen; Tian-Jian Chu; Hsin-Lu Chen; Chih-Hung Pan; Chih-Cheng Shih; Jin-Cheng Zheng; Simon M Sze
Journal:  Nanoscale Res Lett       Date:  2015-03-12       Impact factor: 4.703

2.  Mechanisms of Low-Temperature Nitridation Technology on a TaN Thin Film Resistor for Temperature Sensor Applications.

Authors:  Huey-Ru Chen; Ying-Chung Chen; Ting-Chang Chang; Kuan-Chang Chang; Tsung-Ming Tsai; Tian-Jian Chu; Chih-Cheng Shih; Nai-Chuan Chuang; Kao-Yuan Wang
Journal:  Nanoscale Res Lett       Date:  2016-06-01       Impact factor: 4.703

  2 in total

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