| Literature DB >> 21832591 |
Yu-Tung Chen1, Tsung-Nan Lo, Yong S Chu, Jaemock Yi, Chi-Jen Liu, Jun-Yue Wang, Cheng-Liang Wang, Chen-Wei Chiu, Tzu-En Hua, Yeukuang Hwu, Qun Shen, Gung-Chian Yin, Keng S Liang, Hong-Ming Lin, Jung Ho Je, Giorgio Margaritondo.
Abstract
The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.Entities:
Year: 2008 PMID: 21832591 DOI: 10.1088/0957-4484/19/39/395302
Source DB: PubMed Journal: Nanotechnology ISSN: 0957-4484 Impact factor: 3.874