Literature DB >> 21832484

Making tracks: electronic excitation roles in forming swift heavy ion tracks.

N Itoh1, D M Duffy, S Khakshouri, A M Stoneham.   

Abstract

Swift heavy ions cause material modification along their tracks, changes primarily due to their very dense electronic excitation. The available data for threshold stopping powers indicate two main classes of materials. Group I, with threshold stopping powers above about 10 keV nm(-1), includes some metals, crystalline semiconductors and a few insulators. Group II, with lower thresholds, comprises many insulators, amorphous materials and high T(c) oxide superconductors. We show that the systematic differences in behaviour result from different coupling of the dense excited electrons, holes and excitons to atomic (ionic) motions, and the consequent lattice relaxation. The coupling strength of excitons and charge carriers with the lattice is crucial. For group II, the mechanism appears to be the self-trapped exciton model of Itoh and Stoneham (1998 Nucl. Instrum. Methods Phys. Res. B 146 362): the local structural changes occur roughly when the exciton concentration exceeds the number of lattice sites. In materials of group I, excitons are not self-trapped and structural change requires excitation of a substantial fraction of bonding electrons, which induces spontaneous lattice expansion within a few hundred femtoseconds, as recently observed by laser-induced time-resolved x-ray diffraction of semiconductors. Our analysis addresses a number of experimental results, such as track morphology, the efficiency of track registration and the ratios of the threshold stopping power of various materials.

Entities:  

Year:  2009        PMID: 21832484     DOI: 10.1088/0953-8984/21/47/474205

Source DB:  PubMed          Journal:  J Phys Condens Matter        ISSN: 0953-8984            Impact factor:   2.333


  6 in total

1.  Formation of swift heavy ion tracks on a rutile TiO2 (001) surface.

Authors:  Marko Karlušić; Sigrid Bernstorff; Zdravko Siketić; Branko Šantić; Ivančica Bogdanović-Radović; Milko Jakšić; Marika Schleberger; Maja Buljan
Journal:  J Appl Crystallogr       Date:  2016-09-23       Impact factor: 3.304

2.  Monitoring Ion Track Formation Using In Situ RBS/c, ToF-ERDA, and HR-PIXE.

Authors:  Marko Karlušić; Stjepko Fazinić; Zdravko Siketić; Tonči Tadić; Donny Domagoj Cosic; Iva Božičević-Mihalić; Ivana Zamboni; Milko Jakšić; Marika Schleberger
Journal:  Materials (Basel)       Date:  2017-09-06       Impact factor: 3.623

3.  Ion tracks in silicon formed by much lower energy deposition than the track formation threshold.

Authors:  H Amekura; M Toulemonde; K Narumi; R Li; A Chiba; Y Hirano; K Yamada; S Yamamoto; N Ishikawa; N Okubo; Y Saitoh
Journal:  Sci Rep       Date:  2021-01-08       Impact factor: 4.379

4.  Swift Heavy Ion-Induced Reactivity and Surface Modifications in Indium Thin Films.

Authors:  Zara Aftab; Indra Sulania; Asokan Kandasami; Lekha Nair
Journal:  ACS Omega       Date:  2022-09-06

5.  Ionization-induced annealing of pre-existing defects in silicon carbide.

Authors:  Yanwen Zhang; Ritesh Sachan; Olli H Pakarinen; Matthew F Chisholm; Peng Liu; Haizhou Xue; William J Weber
Journal:  Nat Commun       Date:  2015-08-12       Impact factor: 14.919

6.  High-Energy Heavy Ion Irradiation of Al2O3, MgO and CaF2.

Authors:  Juraj Hanžek; Pavo Dubček; Stjepko Fazinić; Kristina Tomić Luketić; Marko Karlušić
Journal:  Materials (Basel)       Date:  2022-03-13       Impact factor: 3.623

  6 in total

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