Literature DB >> 21825760

Growth behavior near the ultimate resolution of nanometer-scale focused electron beam-induced deposition.

W F van Dorp1, C W Hagen, P A Crozier, P Kruit.   

Abstract

An attempt has been made to reach the ultimate spatial resolution for electron beam-induced deposition (EBID) using W(CO)(6) as a precursor. The smallest dots that have been written have an average diameter of 0.72 nm at full width at half maximum (FWHM). A study of the nucleation stage revealed that the growth is different for each dot, despite identical growth conditions. The center of mass of each dot is not exactly on the position irradiated by the e-beam but on a random spot close to the irradiated spot. Also, the growth rate is not constant during deposition and the final deposited volume varies from dot to dot. The annular dark field signal was recorded during growth in the hope to find discrete steps in the signal which would be evidence of the one-by-one deposition of single molecules. Discrete steps were not observed, but by combining atomic force microscope measurements and a statistical analysis of the deposited volumes, it was possible to estimate the average volume of the units of which the deposits consist. It is concluded that the volume per unit is as small as 0.4 nm(3), less than twice the volume of a single W(CO)(6) molecule in the solid phase.

Entities:  

Year:  2008        PMID: 21825760     DOI: 10.1088/0957-4484/19/22/225305

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  6 in total

1.  Focused electron beam induced deposition: A perspective.

Authors:  Michael Huth; Fabrizio Porrati; Christian Schwalb; Marcel Winhold; Roland Sachser; Maja Dukic; Jonathan Adams; Georg Fantner
Journal:  Beilstein J Nanotechnol       Date:  2012-08-29       Impact factor: 3.649

2.  Structural and electronic analysis of the atomic scale nucleation of Ag on α-Ag2WO4 induced by electron irradiation.

Authors:  Juan Andrés; Lourdes Gracia; Patricio Gonzalez-Navarrete; Valeria M Longo; Waldir Avansi; Diogo P Volanti; Mateus M Ferrer; Pablo S Lemos; Felipe A La Porta; Antonio C Hernandes; Elson Longo
Journal:  Sci Rep       Date:  2014-06-23       Impact factor: 4.379

3.  Electrochemical electron beam lithography: Write, read, and erase metallic nanocrystals on demand.

Authors:  Jeung Hun Park; Daniel A Steingart; Suneel Kodambaka; Frances M Ross
Journal:  Sci Adv       Date:  2017-07-12       Impact factor: 14.136

4.  Core-Shell Plasmonic Nanohelices.

Authors:  Dolfine Kosters; Anouk de Hoogh; Hans Zeijlemaker; Hakkı Acar; Nir Rotenberg; L Kuipers
Journal:  ACS Photonics       Date:  2017-06-13       Impact factor: 7.529

Review 5.  Charged particle single nanometre manufacturing.

Authors:  Philip D Prewett; Cornelis W Hagen; Claudia Lenk; Steve Lenk; Marcus Kaestner; Tzvetan Ivanov; Ahmad Ahmad; Ivo W Rangelow; Xiaoqing Shi; Stuart A Boden; Alex P G Robinson; Dongxu Yang; Sangeetha Hari; Marijke Scotuzzi; Ejaz Huq
Journal:  Beilstein J Nanotechnol       Date:  2018-11-14       Impact factor: 3.649

Review 6.  Focused Electron Beam-Based 3D Nanoprinting for Scanning Probe Microscopy: A Review.

Authors:  Harald Plank; Robert Winkler; Christian H Schwalb; Johanna Hütner; Jason D Fowlkes; Philip D Rack; Ivo Utke; Michael Huth
Journal:  Micromachines (Basel)       Date:  2019-12-30       Impact factor: 2.891

  6 in total

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