| Literature DB >> 21825759 |
Namil Koo1, Ulrich Plachetka, Martin Otto, Jens Bolten, Jun-Ho Jeong, Eung-Sug Lee, Heinrich Kurz.
Abstract
One key issue for all nanoimprint techniques is an appropriate method for the fabrication of desirable molds. We report on a novel flexible mold fabrication process-pressure-assisted molding (PAM)-for high resolution soft ultraviolet nanoimprint lithography (soft UV-NIL). In PAM, enhanced master filling is achieved by applying an external pressure during the mold fabrication process. Flexible molds, fabricated with PAM using different pressures in the range of 10-90 kPa, are compared to determine the role of pressures applied in the imprint performance.Year: 2008 PMID: 21825759 DOI: 10.1088/0957-4484/19/22/225304
Source DB: PubMed Journal: Nanotechnology ISSN: 0957-4484 Impact factor: 3.874