| Literature DB >> 21775805 |
Shu-Wei Wang1, H E Lin, Huang-De Lin, K Y Chen, Kun-Hua Tu, C W Chen, Ju-Ying Chen, Cheng-Hua Liu, C-T Liang, Y F Chen.
Abstract
The electron transport behavior in chemically reduced graphene oxide (rGO) sheets with different thicknesses of 2, 3, and 5 nm was investigated. The four-probe method for the sheet resistance (R(S)) measurement on the intensively reduced graphene oxide samples indicates an Arrhenius characteristic of the electron transport at zero magnetic field B = 0, consistent with previous experimental results on well-reduced GO samples. The anticipated variable range hopping (VRH) transport of electrons in a two-dimensional electron system at low temperatures was not observed. The measured R(S) of the rGO samples are below 52 kΩ/square at room temperature. With the application of a magnetic field up to 4 T, negative magnetoresistance in the Mott VRH regime was observed. The magnetotransport features support a model based on the spin-coupling effect from the vacancy-induced midgap states that facilitate the Mott VRH conduction in the presence of an external magnetic field.Entities:
Year: 2011 PMID: 21775805 DOI: 10.1088/0957-4484/22/33/335701
Source DB: PubMed Journal: Nanotechnology ISSN: 0957-4484 Impact factor: 3.874