| Literature DB >> 21750767 |
Leonardo A Ambrosio1, Hugo E Hernández-Figueroa.
Abstract
Ordinary Bessel beams are described in terms of the generalized Lorenz-Mie theory (GLMT) by adopting, for what is to our knowledge the first time in the literature, the integral localized approximation for computing their beam shape coefficients (BSCs) in the expansion of the electromagnetic fields. Numerical results reveal that the beam shape coefficients calculated in this way can adequately describe a zero-order Bessel beam with insignificant difference when compared to other relative time-consuming methods involving numerical integration over the spherical coordinates of the GLMT coordinate system, or quadratures. We show that this fast and efficient new numerical description of zero-order Bessel beams can be used with advantage, for example, in the analysis of optical forces in optical trapping systems for arbitrary optical regimes.Entities:
Keywords: (080.0080) Geometric Optics; (170.4520) Optical confinement and manipulation; (290.4020) Mie theory; (290.5825) Scattering theory; (350.4855) Optical tweezers or optical manipulation
Year: 2011 PMID: 21750767 PMCID: PMC3130576 DOI: 10.1364/BOE.2.001893
Source DB: PubMed Journal: Biomed Opt Express ISSN: 2156-7085 Impact factor: 3.732
Fig. 1Geometrical description of an ordinary Bessel beam propagating parallel to + z (out of the page). The optical axis makes an angle ϕ0 relative to the x-axis and is displaced ρ0 from the origin O of the coordinate system.
Beam-shape coefficients evaluated by quadratures (methods F1 and F2) and using the integral localized approximation ILA for an on-axis (ρ0 = ϕ0 = 0) zero-order Bessel beam with λ = 1064 nm and θ = 0.0141 rad
| 1 | 0.499975 | 0.499976 + | 0.499450 + |
| 2 | 0.499900 | 0.499901 + | 0.497927 + |
| 3 | 0.499776 | 0.499773 - | 0.494984 + |
| 4 | 0.499602 | 0.499593 - | 0.495807 + |
| 5 | 0.499379 | 0.499362 + | 0.495963 + |
| 10 | 0.497518 | 0.497454 + | 0.491495 + |
| 15 | 0.494424 | 0.494301 - | 0.487111 + |
| 20 | 0.490109 | 0.489921 - | 0.484364 + |
| 50 | 0.439779 | 0.439164 - | 0.432009 - |
| 100 | 0.280726 | 0.279540 - | 0.266963 + |
| 200 | −0.965629 x 10−1 | 0.111491 - | — |
| 400 | 0.201049 x 10−1 | 0.928932 x 10−3 | — |
We have chosen to present numbers with six digits, according to the convention adopted by previous authors [7].
Elapsed time (in seconds) for computing the BSC’s of an on-axis (ρ0 = ϕ0 = 0) zero-order Bessel beam with λ = 1064 nm and θ = 0.0141 rad
| 1 | 0.549968 x 10−3 | 0.512970 (0.933) | 0.210406 x 103 (0.383) |
| 2 | 0.449984 x 10−3 | 0.531625 (1.181) | 0.215234 x 103 (0.478) |
| 3 | 0.675186 x 10−3 | 0.546375 (0.809) | 0.220765 x 103 (0.327) |
| 4 | 0.574975 x 10−3 | 0.593000 (1.031) | 0.222328 x 103 (0.387) |
| 5 | 0.599977 x 10−3 | 0.593521 (0.989) | 0.224562 x 103 (0.374) |
| 10 | 0.349988 x 10−3 | 0.624250 (1.784) | 0.236734 x 103 (0.676) |
| 15 | 0.599975 x 10−3 | 0.702250 (1.170) | 0.252047 x 103 (0.420) |
| 20 | 0.524983 x 10−3 | 0.734125 (1.398) | 0.280725 x 103 (0.535) |
| 50 | 0.274985 x 10−3 | 0.968750 (3.523) | 0.422434 x 103 (1.536) |
| 100 | 0.599973 x 10−3 | 0.139013 x 101 (2.317) | 0.570141 x 103 (0.950) |
| 200 | 0.349975 x 10−3 | 0.223350 x 101 (6.382) | — |
| 400 | 0.268730 x 10−3 | 0.398363 x 101 (14.824) | — |
We have chosen to present numbers with six digits.
The numbers in parentheses represent the ratio (x103 for F1 and x106 for F2) between the elapsed time for the method and the corresponding one from the integral localized approximation.
Fig. 2E-field intensity profile for a Bessel beam with λ = 1064 nm, θ = 0.0141 rad and displaced (a) ρ0 = 0, (b) ρ0 = 30 μm, (c) ρ0 = 60 μm and (d) ρ0 = 90 μm along x. The accuracy of the ILA for increasing x depends on increasing the number of BSCs entering superposition (18) and (19). In all cases, m = 15.
Fig. 3(a) 3D and (b) 2D Ey-field intensity profile for an on-axis x-polarized Bessel beam with λ = 500 nm, Δρ = 10.0 μm (θa ≈ 1.1°). The Fortran code was run by imposing nmax = 1800 (non-zero BSCs occur only for |m| = 1). (c) and (d) are the corresponding Ez-field.
Fig. 4.a) 3D and (b) 2D Ey-field intensity profile for an off-axis (ρ0 = 5 μm and ϕ0 = π/2) x-polarized Bessel beam with λ = 532 nm, Δρ = 2.336 μm (θa = 5°, representing a limiting angle for the paraxial approximation). The Fortran code was run by imposing nmax = and mmax = 15. (c) and (d) show the corresponding Ez-field.
Fig. 5Normalized force profile exerted on a dielectric simple particle of relative refractive index nrel = 1.1. The field intensity of the zero-order Bessel beam is also shown as a solid line. All parameters of the incident beam are the same as those of Fig. 2. Positive Fx/Fmax means an attractive force towards the optical axis of the beam.
Fig. 6Radiation pressure cross-section C (solid) for an x-polarized Bessel beam displaced along x using the ILA. The beam has λ = 802.7 nm and Δρ ≈2.35 μm in water (n = 1.33). The beam intensity is shown as a dotted line. The silicon spheres have a refractive index n = 1.4496 and radii a = 1.15 μm (a), 2.15 μm (b), 2.50 μm (c) and 3.42 μm (d). Points of stable equilibrium are close to those predicted in Ref. [21], where a quadrature scheme was adopted for numerically implementing the GLMT.