Literature DB >> 21747448

Application of image spectrometer to in situ infrared broadband optical monitoring for thin film deposition.

Qing-Yuan Cai1, Yu-Xiang Zheng, Dong-Xu Zhang, Wei-Jie Lu, Rong-Jun Zhang, Wei Lin, Hai-Bin Zhao, Liang-Yao Chen.   

Abstract

A path-folded infrared image spectrometer with five sub-gratings and five linear-array detectors was applied to a broadband optical monitoring (BOM) system for thin film deposition. Through in situ BOM, we can simultaneously acquire the thickness and refractive index of each layer in real time by fitting the measured spectra, and modify the deposition parameters during deposition process according to the fitting results. An effective data processing method was proposed and applied in the BOM process, and it shortened the data processing time and improved the monitoring efficiency greatly. For demonstration, a narrow band-pass filter (NBF) at 1540 nm with ~10 nm full width at half-maximum (FWHM) had been manufactured using the developed BOM system, and the results showed that this BOM method was satisfying for monitoring deposition of thin film devices.

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Year:  2011        PMID: 21747448     DOI: 10.1364/OE.19.012969

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  1 in total

1.  The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition.

Authors:  Zi-Yi Wang; Rong-Jun Zhang; Hong-Liang Lu; Xin Chen; Yan Sun; Yun Zhang; Yan-Feng Wei; Ji-Ping Xu; Song-You Wang; Yu-Xiang Zheng; Liang-Yao Chen
Journal:  Nanoscale Res Lett       Date:  2015-02-06       Impact factor: 4.703

  1 in total

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