Surface structure of polar Co(3)O(4)(111) films grown epitaxially on Ir(100)-(1 × 1).

Cobalt oxide films were prepared by oxidation of different amounts of cobalt deposited on Ir(100)-(1 × 1), where oxygen rich conditions were applied during deposition. The resulting oxide films with thicknesses of up to about 40 Å were investigated as regards their crystallographic structure and morphology, applying quantitative low energy electron diffraction (LEED) and scanning tunnelling microscopy (STM). It can be unequivocally shown that the spinel-type Co(3)O(4) phase develops, for which an excellent fit between measured and calculated LEED intensity spectra is achieved (Pendry R-factor R = 0.124). In spite of the quadratic unit cell of the substrate the oxide films are in the polar (111) orientation. Also, the native lattice parameter of the material is assumed, i.e. there is no pseudomorphic relation to the substrate. However, by means of orientational epitaxy, one of the unit-mesh vectors of the oxide and one of those of the substrate layer are aligned, leading to two mutually orthogonal domains in the oxide. The oxide is terminated by a sublayer of cobalt ions which in the bulk were tetrahedrally coordinated Co(2+) ions. There are drastic relaxations of layer spacings at and near the surface. As a consequence, the bond length between the surface terminating cobalt ions and oxygen ions below is considerably reduced, indicative of a substantial change of the ionicity of the cobalt and/or oxygen ions. This is interpreted as accounting for polarity compensation of the film, as surface reconstruction, oxygen vacancies and species adsorbed can be ruled out.