Modeling for accurate dimensional scanning electron microscope metrology: then and now.

A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for modeling the generation of the electrons used for imaging and measurement. The progress of modeling for accurate metrology is discussed through a schematic technology timeline. In addition, a discussion of a future vision for accurate SEM dimensional metrology and the requirements to achieve it are presented. This article is a US Government work and, as such, is in the public domain in the United States of America. Published 2011 by Wiley Periodicals, Inc.