| Literature DB >> 21576792 |
Ze Liu1, Peter Bøggild, Jia-rui Yang, Yao Cheng, Francois Grey, Yi-lun Liu, Li Wang, Quan-shui Zheng.
Abstract
We present here a method for cleaning intermediate-size (up to 50 nm) contamination from highly oriented pyrolytic graphite and graphene. Electron-beam-induced deposition of carbonaceous material on graphene and graphite surfaces inside a scanning electron microscope, which is difficult to remove by conventional techniques, can be removed by direct mechanical wiping using a graphite nanoeraser, thus drastically reducing the amount of contamination. We discuss potential applications of this cleaning procedure.Entities:
Year: 2011 PMID: 21576792 DOI: 10.1088/0957-4484/22/26/265706
Source DB: PubMed Journal: Nanotechnology ISSN: 0957-4484 Impact factor: 3.874