Literature DB >> 21572206

Nanofilamentary resistive switching in binary oxide system; a review on the present status and outlook.

Kyung Min Kim1, Doo Seok Jeong, Cheol Seong Hwang.   

Abstract

This review article summarized the recent understanding of resistance switching (RS) behavior in several binary oxide thin film systems. Among the various RS materials and mechanisms, TiO(2) and NiO thin films in unipolar thermo-chemical switching mode are primarily dealt with. To facilitate the discussions, the RS was divided into three parts; electroforming, set and reset steps. After short discussions on the electrochemistry of 'electrolytic' oxide materials, the general and peculiar aspects of these RS systems and mechanism are elaborated. Although the RS behaviors and characteristics of these materials are primarily dependent on the repeated formation and rupture of the conducting filaments (CFs) at the nanoscale at a localized position, this mechanism appears to offer a basis for the understanding of other RS mechanisms which were originally considered to be irrelevant to the localized events. The electroforming and set switching phenomena were understood as the process of CF formation and rejuvenation, respectively, which are mainly driven by the thermally assisted electromigration and percolation (or even local phase transition) of defects, while the reset process was understood as the process of CF rupture where the thermal energy plays a more crucial role. This review also contains several remarks on the outlook of these resistance change devices as a semiconductor memory.

Entities:  

Year:  2011        PMID: 21572206     DOI: 10.1088/0957-4484/22/25/254002

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  37 in total

1.  Memristive devices for computing.

Authors:  J Joshua Yang; Dmitri B Strukov; Duncan R Stewart
Journal:  Nat Nanotechnol       Date:  2013-01       Impact factor: 39.213

2.  Temporary formation of highly conducting domain walls for non-destructive read-out of ferroelectric domain-wall resistance switching memories.

Authors:  Jun Jiang; Zi Long Bai; Zhi Hui Chen; Long He; David Wei Zhang; Qing Hua Zhang; Jin An Shi; Min Hyuk Park; James F Scott; Cheol Seong Hwang; An Quan Jiang
Journal:  Nat Mater       Date:  2017-11-20       Impact factor: 43.841

Review 3.  A Collective Study on Modeling and Simulation of Resistive Random Access Memory.

Authors:  Debashis Panda; Paritosh Piyush Sahu; Tseung Yuen Tseng
Journal:  Nanoscale Res Lett       Date:  2018-01-10       Impact factor: 4.703

4.  Stability-Enhanced Resistive Random-Access Memory via Stacked In x Ga1-x O by the RF Sputtering Method.

Authors:  Wei-Lun Huang; Yong-Zhe Lin; Sheng-Po Chang; Wei-Chih Lai; Shoou-Jinn Chang
Journal:  ACS Omega       Date:  2021-04-13

5.  Voltage and power-controlled regimes in the progressive unipolar RESET transition of HfO₂-based RRAM.

Authors:  Shibing Long; Luca Perniola; Carlo Cagli; Julien Buckley; Xiaojuan Lian; Enrique Miranda; Feng Pan; Ming Liu; Jordi Suñé
Journal:  Sci Rep       Date:  2013-10-14       Impact factor: 4.379

6.  In situ imaging of the conducting filament in a silicon oxide resistive switch.

Authors:  Jun Yao; Lin Zhong; Douglas Natelson; James M Tour
Journal:  Sci Rep       Date:  2012-01-31       Impact factor: 4.379

7.  Deterministic conversion between memory and threshold resistive switching via tuning the strong electron correlation.

Authors:  Hai Yang Peng; Yong Feng Li; Wei Nan Lin; Yu Zhan Wang; Xing Yu Gao; Tom Wu
Journal:  Sci Rep       Date:  2012-06-07       Impact factor: 4.379

8.  Emulating short-term synaptic dynamics with memristive devices.

Authors:  Radu Berdan; Eleni Vasilaki; Ali Khiat; Giacomo Indiveri; Alexandru Serb; Themistoklis Prodromakis
Journal:  Sci Rep       Date:  2016-01-04       Impact factor: 4.379

9.  Correlative multimodal probing of ionically-mediated electromechanical phenomena in simple oxides.

Authors:  Yunseok Kim; Evgheni Strelcov; In Rok Hwang; Taekjib Choi; Bae Ho Park; Stephen Jesse; Sergei V Kalinin
Journal:  Sci Rep       Date:  2013-10-11       Impact factor: 4.379

10.  Switching operation and degradation of resistive random access memory composed of tungsten oxide and copper investigated using in-situ TEM.

Authors:  Masashi Arita; Akihito Takahashi; Yuuki Ohno; Akitoshi Nakane; Atsushi Tsurumaki-Fukuchi; Yasuo Takahashi
Journal:  Sci Rep       Date:  2015-11-27       Impact factor: 4.379

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