Literature DB >> 21517400

Contact angle hysteresis at the nanometer scale.

Mathieu Delmas1, Marc Monthioux, Thierry Ondarçuhu.   

Abstract

Using atomic force microscopy with nonconventional carbon tips, the pinning of a liquid contact line on individual nanometric defects was studied. This mechanism is responsible for the occurrence of the contact angle hysteresis. The presence of weak defects which do not contribute to the hysteresis is evidenced for the first time. The dissipated energy associated with strong defects is also measured down to values in the range of kT, which correspond to defect sizes in the order of 1 nm.
© 2011 American Physical Society

Entities:  

Year:  2011        PMID: 21517400     DOI: 10.1103/PhysRevLett.106.136102

Source DB:  PubMed          Journal:  Phys Rev Lett        ISSN: 0031-9007            Impact factor:   9.161


  6 in total

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Authors:  Tak-Sing Wong; Sung Hoon Kang; Sindy K Y Tang; Elizabeth J Smythe; Benjamin D Hatton; Alison Grinthal; Joanna Aizenberg
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4.  Mapping microscale wetting variations on biological and synthetic water-repellent surfaces.

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Journal:  Nat Commun       Date:  2017-11-27       Impact factor: 14.919

5.  Measuring adhesion on rough surfaces using atomic force microscopy with a liquid probe.

Authors:  Juan V Escobar; Cristina Garza; Rolando Castillo
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6.  A moving contact line as a rheometer for nanometric interfacial layers.

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Journal:  Nat Commun       Date:  2016-08-26       Impact factor: 14.919

  6 in total

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