Literature DB >> 21504221

Patterning NHS-terminated SAMs on germanium.

Carleen J Morris1, Alexander A Shestopalov, Brian H Gold, Robert L Clark, Eric J Toone.   

Abstract

Here we report a simple, robust approach to patterning functional SAMs on germanium. The protocol relies on catalytic soft-lithographic pattern transfer from an elastomeric stamp bearing pendant immobilized sulfonic acid moieties to an NHS-functionalized bilayer molecular system comprising a primary ordered alkyl monolayer and a reactive ester secondary overlayer. The catalytic polyurethane-acrylate stamp was used to form micrometer-scale features of chemically distinct SAMs on germanium. The methodology represents the first example of patterned SAMs on germanium, a semiconductor material.

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Year:  2011        PMID: 21504221     DOI: 10.1021/la200374k

Source DB:  PubMed          Journal:  Langmuir        ISSN: 0743-7463            Impact factor:   3.882


  1 in total

1.  Soft lithographic functionalization and patterning oxide-free silicon and germanium.

Authors:  Carleen M Bowers; Eric J Toone; Robert L Clark; Alexander A Shestopalov
Journal:  J Vis Exp       Date:  2011-12-16       Impact factor: 1.355

  1 in total

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