Literature DB >> 21486089

Dynamic conductivity of ferroelectric domain walls in BiFeO₃.

Peter Maksymovych1, Jan Seidel, Ying Hao Chu, Pingping Wu, Arthur P Baddorf, Long-Qing Chen, Sergei V Kalinin, Ramamoorthy Ramesh.   

Abstract

Topological walls separating domains of continuous polarization, magnetization, and strain in ferroic materials hold promise of novel electronic properties, that are intrinsically localized on the nanoscale and that can be patterned on demand without change of material volume or elemental composition. We have revealed that ferroelectric domain walls in multiferroic BiFeO(3) are inherently dynamic electronic conductors, closely mimicking memristive behavior and contrary to the usual assumption of rigid conductivity. Applied electric field can cause a localized transition between insulating and conducting domain walls, tune domain wall conductance by over an order of magnitude, and create a quasicontinuous spectrum of metastable conductance states. Our measurements identified that subtle and microscopically reversible distortion of the polarization structure at the domain wall is at the origin of the dynamic conductivity. The latter is therefore likely to be a universal property of topological defects in ferroelectric semiconductors.

Entities:  

Year:  2011        PMID: 21486089     DOI: 10.1021/nl104363x

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  15 in total

Review 1.  Ultrathin Ferroelectric Films: Growth, Characterization, Physics and Applications.

Authors:  Ying Wang; Weijin Chen; Biao Wang; Yue Zheng
Journal:  Materials (Basel)       Date:  2014-09-11       Impact factor: 3.623

2.  Defect engineering using crystal symmetry.

Authors:  Ramamoorthy Ramesh
Journal:  Proc Natl Acad Sci U S A       Date:  2018-08-31       Impact factor: 11.205

3.  Temporary formation of highly conducting domain walls for non-destructive read-out of ferroelectric domain-wall resistance switching memories.

Authors:  Jun Jiang; Zi Long Bai; Zhi Hui Chen; Long He; David Wei Zhang; Qing Hua Zhang; Jin An Shi; Min Hyuk Park; James F Scott; Cheol Seong Hwang; An Quan Jiang
Journal:  Nat Mater       Date:  2017-11-20       Impact factor: 43.841

4.  Influence of Oxygen Pressure on the Domain Dynamics and Local Electrical Properties of BiFe0.95Mn0.05O₃ Thin Films Studied by Piezoresponse Force Microscopy and Conductive Atomic Force Microscopy.

Authors:  Kunyu Zhao; Huizhu Yu; Jian Zou; Huarong Zeng; Guorong Li; Xiaomin Li
Journal:  Materials (Basel)       Date:  2017-11-01       Impact factor: 3.623

5.  A diode for ferroelectric domain-wall motion.

Authors:  J R Whyte; J M Gregg
Journal:  Nat Commun       Date:  2015-06-10       Impact factor: 14.919

6.  Microwave a.c. conductivity of domain walls in ferroelectric thin films.

Authors:  Alexander Tselev; Pu Yu; Ye Cao; Liv R Dedon; Lane W Martin; Sergei V Kalinin; Petro Maksymovych
Journal:  Nat Commun       Date:  2016-05-31       Impact factor: 14.919

7.  Structural and electronic transformation pathways in morphotropic BiFeO3.

Authors:  P Sharma; Y Heo; B-K Jang; Y Y Liu; J Y Li; C-H Yang; J Seidel
Journal:  Sci Rep       Date:  2016-09-01       Impact factor: 4.379

8.  Enlarging photovoltaic effect: combination of classic photoelectric and ferroelectric photovoltaic effects.

Authors:  Jingjiao Zhang; Xiaodong Su; Mingrong Shen; Zhihua Dai; Lingjun Zhang; Xiyun He; Wenxiu Cheng; Mengyu Cao; Guifu Zou
Journal:  Sci Rep       Date:  2013       Impact factor: 4.379

9.  Hall effect in charged conducting ferroelectric domain walls.

Authors:  M P Campbell; J P V McConville; R G P McQuaid; D Prabhakaran; A Kumar; J M Gregg
Journal:  Nat Commun       Date:  2016-12-12       Impact factor: 14.919

10.  Field enhancement of electronic conductance at ferroelectric domain walls.

Authors:  Rama K Vasudevan; Ye Cao; Nouamane Laanait; Anton Ievlev; Linglong Li; Jan-Chi Yang; Ying-Hao Chu; Long-Qing Chen; Sergei V Kalinin; Petro Maksymovych
Journal:  Nat Commun       Date:  2017-11-06       Impact factor: 14.919

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