Literature DB >> 21456803

Note: Quantitative (artifact-free) surface potential measurements using Kelvin force microscopy.

T Mélin1, S Barbet, H Diesinger, D Théron, D Deresmes.   

Abstract

The measurement of local surface potentials by Kelvin force microscopy (KFM) can be sensitive to external perturbations which lead to artifacts such as strong dependences of experimental results (typically in a ∼1 V range) with KFM internal parameters (cantilever excitation frequency and/or the projection phase of the KFM feedback-loop). We analyze and demonstrate a correction of such effects on a KFM implementation in ambient air. Artifact-free KFM measurements, i.e., truly quantitative surface potential measurements, are obtained with a ∼30 mV accuracy.

Year:  2011        PMID: 21456803     DOI: 10.1063/1.3516046

Source DB:  PubMed          Journal:  Rev Sci Instrum        ISSN: 0034-6748            Impact factor:   1.523


  3 in total

1.  Know your full potential: Quantitative Kelvin probe force microscopy on nanoscale electrical devices.

Authors:  Amelie Axt; Ilka M Hermes; Victor W Bergmann; Niklas Tausendpfund; Stefan A L Weber
Journal:  Beilstein J Nanotechnol       Date:  2018-06-15       Impact factor: 3.649

2.  Comparing the performance of single and multifrequency Kelvin probe force microscopy techniques in air and water.

Authors:  Jason I Kilpatrick; Emrullah Kargin; Brian J Rodriguez
Journal:  Beilstein J Nanotechnol       Date:  2022-09-12       Impact factor: 3.272

3.  Full data acquisition in Kelvin Probe Force Microscopy: Mapping dynamic electric phenomena in real space.

Authors:  Liam Collins; Alex Belianinov; Suhas Somnath; Nina Balke; Sergei V Kalinin; Stephen Jesse
Journal:  Sci Rep       Date:  2016-08-12       Impact factor: 4.379

  3 in total

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