| Literature DB >> 21456198 |
Abstract
Nowadays, many researchers try to measure the collapse force of fine pattern. However, most of the researches use LFM to gauge it indirectly and LFM can measure not for collapse force directly but only limited for horizontal force. Thus, nano-scratch is suggested to measure the collapse force possibly. We used poly-Si pattern on Si plate and changed the z-location of the pattern. From these experiments, the stiffness was decease as depth increase from surface and well fitted with negative exponential curve. Also, the elastic modulus was decreased. From the results, the collapse force of poly-Si nano-patterns was decreased as the depth increased over than 30% from the surface and the maximum collapse force was 26.91 microN and pattern was collapsed between poly-Si and plate.Entities:
Year: 2011 PMID: 21456198 DOI: 10.1166/jnn.2011.3392
Source DB: PubMed Journal: J Nanosci Nanotechnol ISSN: 1533-4880