| Literature DB >> 21444951 |
Woojin Park1, Gunho Jo, Woong-Ki Hong, Jongwon Yoon, Minhyeok Choe, Sangchul Lee, Yongsung Ji, Geunjin Kim, Yung Ho Kahng, Kwanghee Lee, Deli Wang, Takhee Lee.
Abstract
We investigated the enhanced photoresponse of ZnO nanowire transistors that was introduced with surface-roughness-induced traps by a simple chemical treatment with isopropyl alcohol (IPA). The enhanced photoresponse of IPA-treated ZnO nanowire devices is attributed to an increase in adsorbed oxygen on IPA-induced surface traps. The results of this study revealed that IPA-treated ZnO nanowire devices displayed higher photocurrent gains and faster photoswitching speed than transistors containing unmodified ZnO nanowires. Thus, chemical treatment with IPA can be a useful method for improving the photoresponse of ZnO nanowire devices.Entities:
Year: 2011 PMID: 21444951 DOI: 10.1088/0957-4484/22/20/205204
Source DB: PubMed Journal: Nanotechnology ISSN: 0957-4484 Impact factor: 3.874