Contact area lithography and pattern transfer of self-assembled organic monolayers on SiO2/Si substrates.

We describe a procedure for one-step patterning and transfer of self-assembled organic monolayers (SAMs) on SiO(2)/Si substrates. This procedure was inspired from an idea of pattern formation at contact area, which realizes high patterning fidelity, and enables a universal approach for the micro/nanometre scale patterning of SAMs. © The Royal Society of Chemistry 2011