Literature DB >> 21409261

From stochastic single atomic switch to nanoscale resistive memory device.

Attila Geresdi1, András Halbritter, András Gyenis, Péter Makk, György Mihály.   

Abstract

We study the switching characteristics of nanoscale junctions created between a tungsten tip and a silver film covered by a thin ionic conductor layer. Atomic-sized junctions show spectacular current induced switching characteristics, but both the magnitude of the switching voltage and the direction of the switching vary randomly for different junctions. In contrast, somewhat larger junctions with diameters of a few nanometres display a well defined, reproducible switching behavior attributed to the formation and destruction of nanoscale channels in the ionic conductor surface layer. Our results define a lower size limit of 3 nm for reliable ionic nano-switches, which is well below the resolution of recent lithographic techniques.

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Year:  2011        PMID: 21409261     DOI: 10.1039/c0nr00951b

Source DB:  PubMed          Journal:  Nanoscale        ISSN: 2040-3364            Impact factor:   7.790


  6 in total

1.  A current-driven single-atom memory.

Authors:  C Schirm; M Matt; F Pauly; J C Cuevas; P Nielaba; E Scheer
Journal:  Nat Nanotechnol       Date:  2013-09-01       Impact factor: 39.213

2.  Voltage and power-controlled regimes in the progressive unipolar RESET transition of HfO₂-based RRAM.

Authors:  Shibing Long; Luca Perniola; Carlo Cagli; Julien Buckley; Xiaojuan Lian; Enrique Miranda; Feng Pan; Ming Liu; Jordi Suñé
Journal:  Sci Rep       Date:  2013-10-14       Impact factor: 4.379

3.  Asymmetry-induced resistive switching in Ag-Ag2S-Ag memristors enabling a simplified atomic-scale memory design.

Authors:  Agnes Gubicza; Dávid Zs Manrique; László Pósa; Colin J Lambert; György Mihály; Miklós Csontos; András Halbritter
Journal:  Sci Rep       Date:  2016-08-04       Impact factor: 4.379

4.  Atomic switches of metallic point contacts by plasmonic heating.

Authors:  Weiqiang Zhang; Hongshuang Liu; Jinsheng Lu; Lifa Ni; Haitao Liu; Qiang Li; Min Qiu; Bingqian Xu; Takhee Lee; Zhikai Zhao; Xianghui Wang; Maoning Wang; Tao Wang; Andreas Offenhäusser; Dirk Mayer; Wang-Taek Hwang; Dong Xiang
Journal:  Light Sci Appl       Date:  2019-03-27       Impact factor: 17.782

5.  A non-oxidizing fabrication method for lithographic break junctions of sensitive metals.

Authors:  Anna Nyáry; Agnes Gubicza; Jan Overbeck; László Pósa; Péter Makk; Michel Calame; András Halbritter; Miklós Csontos
Journal:  Nanoscale Adv       Date:  2020-07-24

6.  Conductance Quantization in Resistive Random Access Memory.

Authors:  Yang Li; Shibing Long; Yang Liu; Chen Hu; Jiao Teng; Qi Liu; Hangbing Lv; Jordi Suñé; Ming Liu
Journal:  Nanoscale Res Lett       Date:  2015-10-26       Impact factor: 4.703

  6 in total

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