Literature DB >> 21317488

Influencing factors on the size uniformity of self-assembled SiGe quantum rings grown by molecular beam epitaxy.

J Cui1, Y Lv, X J Yang, Y L Fan, Z Zhong, Z M Jiang.   

Abstract

The size uniformity of self-assembled SiGe quantum rings, which are formed by capping SiGe quantum dots with a thin Si layer, is found to be greatly influenced by the growth temperature and the areal density of SiGe quantum dots. Higher growth temperature benefits the size uniformity of quantum dots, but results in low Ge concentration as well as asymmetric Ge distribution in the dots, which induces the subsequently formed quantum rings to be asymmetric in shape or even broken somewhere in the ridge of rings. Low growth temperature degrades the size uniformity of quantum dots, and thus that of quantum rings. A high areal density results in the expansion and coalescence of neighboring quantum dots to form a chain, rather than quantum rings. Uniform quantum rings with a size dispersion of 4.6% and an areal density of 7.8×10(8) cm(-2) are obtained at the optimized growth temperature of 640°C.

Entities:  

Year:  2011        PMID: 21317488     DOI: 10.1088/0957-4484/22/12/125601

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  1 in total

1.  Ordered GeSi nanorings grown on patterned Si (001) substrates.

Authors:  Yingjie Ma; Jian Cui; Yongliang Fan; Zhenyang Zhong; Zuimin Jiang
Journal:  Nanoscale Res Lett       Date:  2011-03-09       Impact factor: 4.703

  1 in total

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