| Literature DB >> 21311806 |
Chi Thanh Nguyen1, Phan Huy Hoang, Jayakumar Perumal, Dong-Pyo Kim.
Abstract
A high resolution negative-tone-type of inorganic-organic diblock copolymer photoresist was synthesized as a novel precursor for simple and direct fabrication of SiCN ceramic mesoporous patterns with ordered nanoscale pores by using a "top-down" photolithographic technique and the subsequent sacrificial processes of a "bottom-up" self-assembled nanostructure.Entities:
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Year: 2011 PMID： 21311806 DOI： 10.1039/c0cc05836j
Source DB: PubMed Journal: Chem Commun (Camb) ISSN： 1359-7345 Impact factor: 6.222