Photo-removal of sulfamethoxazole (SMX) by photolytic and photocatalytic processes in a batch reactor under UV-C radiation (λmax=254 nm).

In this study, photolytic and photocatalytic removal of the antibiotic sulfamethoxazole (SMX) under UVC radiation (λ=254 nm) was investigated. The light intensity distribution inside the batch photoreactor was characterized by azoxybenzene actinometry. The intensity of incident radiation was found to be a strong function of position inside the reactor. 12 mg L(-1) of SMX was completely removed within 10 min of irradiation under UVC photolysis, compared to 30 min under TiO(2) photocatalysis. COD measurement was used as an indication of the mineralization efficiency of both processes and higher COD removal with photocatalysis was shown. After 6h of reaction with photolysis and photocatalysis, 24% and 87% removal of COD was observed, respectively. Two of the intermediate photo-products were identified as sulfanilic acid and 3-amino-5-methylisoxazole by direct comparison of the HPLC chromatograms of standards to those of treated solutions. Ecotoxicity of treated and untreated solutions of SMX towards Daphnia magna was also investigated. It was found that a 3:1 ratio of sample to standard freshwater and a high initial concentration of 60 mg L(-1) of SMX were used to obtain reliable and reproducible results. The photo-products formed during photocatalytic and photolytic processes were shown to be generally more toxic than the parent compound.