A multi-layer electro-optic field probe.

We present a novel design method and sensing scheme for an electro-optic field probe using multi-stratified layers of electro-optic wafers. A serial stack of cascaded layers is found to be capable of enhancing the performance of interferometric electro-optic light modulation that utilizes the slopes of interference fringe patterns and field-induced electro-optic phase retardations within wafers. The absolute sensitivity of the probe is also characterized with a micro-TEM cell that generates electric fields distributions with accurate, calculable strength for use in probe calibration. The sensitivity of a multi-layered probe-per unit electro-optic wafer volume--was enhanced by 6 dB compared to that of a single-layer one.