Literature DB >> 21126056

Photoelectrochemical investigation of ultrathin film iron oxide solar cells prepared by atomic layer deposition.

Benjamin M Klahr1, Alex B F Martinson, Thomas W Hamann.   

Abstract

Atomic layer deposition was used to grow conformal thin films of hematite with controlled thickness on transparent conductive oxide substrates. The hematite films were incorporated as photoelectrodes in regenerative photoelectrochemical cells employing an aqueous [Fe(CN)(6)](3-/4-) electrolyte. Steady state current density versus applied potential measurements under monochromatic and simulated solar illumination were used to probe the photoelectrochemical properties of the hematite electrodes as a function of film thickness. Combining the photoelectrochemical results with careful optical measurements allowed us to determine an optimal thickness for a hematite electrode of ∼20 nm. Mott-Schottky analysis of differential capacitance measurements indicated a depletion region of ∼17 nm. Thus, only charge carriers generated in the depletion region were found to contribute to the photocurrent.

Entities:  

Year:  2010        PMID: 21126056     DOI: 10.1021/la103541n

Source DB:  PubMed          Journal:  Langmuir        ISSN: 0743-7463            Impact factor:   3.882


  8 in total

1.  Atomic Structural Evolution during the Reduction of α-Fe2O3 Nanowires.

Authors:  Wenhui Zhu; Jonathan Winterstein; Itai Maimon; Qiyue Yin; Lu Yuan; Aleksey N Kolmogorov; Renu Sharma; Guangwen Zhou
Journal:  J Phys Chem C Nanomater Interfaces       Date:  2016-06-20       Impact factor: 4.126

2.  Resonant light trapping in ultrathin films for water splitting.

Authors:  Hen Dotan; Ofer Kfir; Elad Sharlin; Oshri Blank; Moran Gross; Irina Dumchin; Guy Ankonina; Avner Rothschild
Journal:  Nat Mater       Date:  2012-11-11       Impact factor: 43.841

3.  Determination of photoelectrochemical water oxidation intermediates on haematite electrode surfaces using operando infrared spectroscopy.

Authors:  Omid Zandi; Thomas W Hamann
Journal:  Nat Chem       Date:  2016-07-04       Impact factor: 24.427

4.  Atomic layer deposition, a unique method for the preparation of energy conversion devices.

Authors:  Julien Bachmann
Journal:  Beilstein J Nanotechnol       Date:  2014-03-05       Impact factor: 3.649

5.  Compact hematite buffer layer as a promoter of nanorod photoanode performances.

Authors:  R Milan; S Cattarin; N Comisso; C Baratto; K Kaunisto; N V Tkachenko; I Concina
Journal:  Sci Rep       Date:  2016-10-13       Impact factor: 4.379

6.  Tantalum nitride films integrated with transparent conductive oxide substrates via atomic layer deposition for photoelectrochemical water splitting.

Authors:  Hamed Hajibabaei; Omid Zandi; Thomas W Hamann
Journal:  Chem Sci       Date:  2016-07-05       Impact factor: 9.825

7.  High-Temperature Atomic Layer Deposition of GaN on 1D Nanostructures.

Authors:  Aaron J Austin; Elena Echeverria; Phadindra Wagle; Punya Mainali; Derek Meyers; Ashish Kumar Gupta; Ritesh Sachan; S Prassana; David N McIlroy
Journal:  Nanomaterials (Basel)       Date:  2020-12-05       Impact factor: 5.076

8.  Template-Free Nanostructured Fluorine-Doped Tin Oxide Scaffolds for Photoelectrochemical Water Splitting.

Authors:  Ivan Garcia-Torregrosa; Jochem H J Wijten; Silvia Zanoni; Freddy E Oropeza; Jan P Hofmann; Emiel J M Hensen; Bert M Weckhuysen
Journal:  ACS Appl Mater Interfaces       Date:  2019-09-30       Impact factor: 9.229

  8 in total

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