| Literature DB >> 21067246 |
Vasilis Fthenakis1, Daniel O Clark, Mehran Moalem, Phil Chandler, Robert G Ridgeway, Forrest E Hulbert, David B Cooper, Peter J Maroulis.
Abstract
Amorphous- and nanocrystalline-silicon thin-film photovoltaic modules are made in high-throughput manufacturing lines that necessitate quickly cleaning the reactor. Using NF₃, a potent greenhouse gas, as the cleaning agent triggered concerns as recent reports reveal that the atmospheric concentrations of this gas have increased significantly. We quantified the life-cycle emissions of NF₃ in photovoltaic (PV) manufacturing, on the basis of actual measurements at the facilities of a major producer of NF₃ and of a manufacturer of PV end-use equipment. From these, we defined the best practices and technologies that are the most likely to keep worldwide atmospheric concentrations of NF₃ at very low radiative forcing levels. For the average U.S. insolation and electricity-grid conditions, the greenhouse gas (GHG) emissions from manufacturing and using NF₃ in current PV a-Si and tandem a-Si/nc-Si facilities add 2 and 7 g CO₂(eq)/kWh, which can be displaced within the first 1-4 months of the PV system life.Entities:
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Year: 2010 PMID: 21067246 DOI: 10.1021/es100401y
Source DB: PubMed Journal: Environ Sci Technol ISSN: 0013-936X Impact factor: 9.028