Literature DB >> 21060485

Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics.

L B Da Silva, T W Barbee, R Cauble, P Celliers, D Ciarlo, J C Moreno, S Mrowka, J E Trebes, A S Wan, F Weber.   

Abstract

The development of multilayer mirror technology capable of operating in the range of 3-30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach-Zehnder interferometer operating at 15.5 nm. We have tested this interferometer by using a soft x-ray laser as a source, and we show its use in probing high-density plasmas.

Year:  1995        PMID: 21060485     DOI: 10.1364/AO.34.006389

Source DB:  PubMed          Journal:  Appl Opt        ISSN: 1559-128X            Impact factor:   1.980


  1 in total

1.  Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources.

Authors:  Ryszard Sobierajski; Rolf Antonie Loch; Robbert W E van de Kruijs; Eric Louis; Gisela von Blanckenhagen; Eric M Gullikson; Frank Siewert; Andrzej Wawro; Fred Bijkerk
Journal:  J Synchrotron Radiat       Date:  2013-01-23       Impact factor: 2.616

  1 in total

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