Literature DB >> 20868181

Half-Heusler compounds as a new class of three-dimensional topological insulators.

Di Xiao1, Yugui Yao, Wanxiang Feng, Jun Wen, Wenguang Zhu, Xing-Qiu Chen, G Malcolm Stocks, Zhenyu Zhang.   

Abstract

Using first-principles calculations within density functional theory, we explore the feasibility of converting ternary half-Heusler compounds into a new class of three-dimensional topological insulators (3DTI). We demonstrate that the electronic structure of unstrained LaPtBi as a prototype system exhibits a distinct band-inversion feature. The 3DTI phase is realized by applying a uniaxial strain along the [001] direction, which opens a band gap while preserving the inverted band order. A definitive proof of the strained LaPtBi as a 3DTI is provided by directly calculating the topological Z2 invariants in systems without inversion symmetry. We discuss the implications of the present study to other half-Heusler compounds as 3DTI, which, together with the magnetic and superconducting properties of these materials, may provide a rich platform for novel quantum phenomena.

Year:  2010        PMID: 20868181     DOI: 10.1103/PhysRevLett.105.096404

Source DB:  PubMed          Journal:  Phys Rev Lett        ISSN: 0031-9007            Impact factor:   9.161


  25 in total

1.  Emergence of non-centrosymmetric topological insulating phase in BiTeI under pressure.

Authors:  M S Bahramy; B-J Yang; R Arita; N Nagaosa
Journal:  Nat Commun       Date:  2012-02-14       Impact factor: 14.919

2.  Topological quantum phase transitions driven by external electric fields in Sb₂Te₃ thin films.

Authors:  Minsung Kim; Choong H Kim; Heung-Sik Kim; Jisoon Ihm
Journal:  Proc Natl Acad Sci U S A       Date:  2011-12-27       Impact factor: 11.205

3.  Prediction and accelerated laboratory discovery of previously unknown 18-electron ABX compounds.

Authors:  Romain Gautier; Xiuwen Zhang; Linhua Hu; Liping Yu; Yuyuan Lin; Tor O L Sunde; Danbee Chon; Kenneth R Poeppelmeier; Alex Zunger
Journal:  Nat Chem       Date:  2015-04       Impact factor: 24.427

4.  Organic topological insulators in organometallic lattices.

Authors:  Z F Wang; Zheng Liu; Feng Liu
Journal:  Nat Commun       Date:  2013       Impact factor: 14.919

5.  Epitaxial growth of large-gap quantum spin Hall insulator on semiconductor surface.

Authors:  Miao Zhou; Wenmei Ming; Zheng Liu; Zhengfei Wang; Ping Li; Feng Liu
Journal:  Proc Natl Acad Sci U S A       Date:  2014-09-22       Impact factor: 11.205

6.  Anomalous Hall effect in Weyl semimetal half-Heusler compounds RPtBi (R = Gd and Nd).

Authors:  Chandra Shekhar; Nitesh Kumar; V Grinenko; Sanjay Singh; R Sarkar; H Luetkens; Shu-Chun Wu; Yang Zhang; Alexander C Komarek; Erik Kampert; Yurii Skourski; Jochen Wosnitza; Walter Schnelle; Alix McCollam; Uli Zeitler; Jürgen Kübler; Binghai Yan; H-H Klauss; S S P Parkin; C Felser
Journal:  Proc Natl Acad Sci U S A       Date:  2018-08-28       Impact factor: 11.205

7.  A search model for topological insulators with high-throughput robustness descriptors.

Authors:  Kesong Yang; Wahyu Setyawan; Shidong Wang; Marco Buongiorno Nardelli; Stefano Curtarolo
Journal:  Nat Mater       Date:  2012-05-13       Impact factor: 43.841

8.  Realization of Dirac Cones in Few Bilayer Sb(111) Films by Surface Modification.

Authors:  Hui Pan; Xue-Sen Wang
Journal:  Nanoscale Res Lett       Date:  2015-08-21       Impact factor: 4.703

9.  Tuning the vertical location of helical surface states in topological insulator heterostructures via dual-proximity effects.

Authors:  Guangfen Wu; Hua Chen; Yan Sun; Xiaoguang Li; Ping Cui; Cesare Franchini; Jinlan Wang; Xing-Qiu Chen; Zhenyu Zhang
Journal:  Sci Rep       Date:  2013-02-06       Impact factor: 4.379

10.  Large linear magnetoresistance and Shubnikov-de Hass oscillations in single crystals of YPdBi Heusler topological insulators.

Authors:  Wenhong Wang; Yin Du; Guizhou Xu; Xiaoming Zhang; Enke Liu; Zhongyuan Liu; Youguo Shi; Jinglan Chen; Guangheng Wu; Xi-Xiang Zhang
Journal:  Sci Rep       Date:  2013       Impact factor: 4.379

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