Literature DB >> 20856546

Synchrotron radiation sources and condensers for projection x-ray lithography.

J B Murphy, D L White, A A Macdowell, O R Wood Ii.   

Abstract

The design requirements for a compact electron storage ring that could be used as a soft-x-ray source for projection lithography are discussed. The design concepts of the x-ray optics that are required for collecting and conditioning the radiation in divergence, uniformity, and direction to illuminate the mask correctly and the particular x-ray projection camera used are discussed. Preliminary designs for an entire soft-x-ray projection lithography system that uses an electron storage ring as a soft-x-ray source are presented. It is shown that, by combining the existing technology of storage rings with large collection angle condensers, a powerful and reliable source of 130-A photons for production line projection x-ray lithography is possible.

Year:  1993        PMID: 20856546     DOI: 10.1364/AO.32.006920

Source DB:  PubMed          Journal:  Appl Opt        ISSN: 1559-128X            Impact factor:   1.980


  1 in total

1.  A synchrotron-based kilowatt-level radiation source for EUV lithography.

Authors:  Bocheng Jiang; Chao Feng; Changliang Li; Zhenghe Bai; Weishi Wan; Dao Xiang; Qiang Gu; Kun Wang; Qinglei Zhang; Dazhang Huang; Senyu Chen
Journal:  Sci Rep       Date:  2022-02-28       Impact factor: 4.379

  1 in total

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