| Literature DB >> 20697574 |
Abstract
Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique.Year: 2010 PMID: 20697574 PMCID: PMC2917861 DOI: 10.1063/1.3437589
Source DB: PubMed Journal: Biomicrofluidics ISSN: 1932-1058 Impact factor: 2.800