Literature DB >> 20680076

High-efficiency 5000 lines/mm multilayer-coated blazed grating for extreme ultraviolet wavelengths.

Dmitriy L Voronov1, Minseung Ahn, Erik H Anderson, Rossana Cambie, Chih-Hao Chang, Eric M Gullikson, Ralf K Heilmann, Farhad Salmassi, Mark L Schattenburg, Tony Warwick, Valeriy V Yashchuk, Lucas Zipp, Howard A Padmore.   

Abstract

Volume x-ray gratings consisting of a multilayer coating deposited on a blazed substrate can diffract with very high efficiency, even in high orders if diffraction conditions in-plane (grating) and out-of-plane (Bragg multilayer) are met simultaneously. This remarkable property, however, depends critically on the ability to create a structure with near atomic perfection. In this Letter we report on a method to produce these structures. We report measurements that show, for a 5000l/mm grating diffracting in the third order, a diffraction efficiency of 37.6% at a wavelength of 13.6nm. This work now shows a direct route to achieving high diffraction efficiency in high order at wavelengths throughout the soft x-ray energy range.

Year:  2010        PMID: 20680076     DOI: 10.1364/OL.35.002615

Source DB:  PubMed          Journal:  Opt Lett        ISSN: 0146-9592            Impact factor:   3.776


  6 in total

1.  Fabrication of 200 nanometer period centimeter area hard x-ray absorption gratings by multilayer deposition.

Authors:  S K Lynch; C Liu; N Y Morgan; X Xiao; A A Gomella; D Mazilu; E E Bennett; L Assoufid; F de Carlo; H Wen
Journal:  J Micromech Microeng       Date:  2012-08-23       Impact factor: 1.881

2.  Theory of oblique and grazing incidence Talbot‑Lau interferometers and demonstration in a compact source x‑ray reflective interferometer.

Authors:  Han Wen; Camille K Kemble; Eric E Bennett
Journal:  Opt Express       Date:  2011-12-05       Impact factor: 3.894

3.  The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II.

Authors:  F Schäfers; P Bischoff; F Eggenstein; A Erko; A Gaupp; S Künstner; M Mast; J-S Schmidt; F Senf; F Siewert; A Sokolov; Th Zeschke
Journal:  J Synchrotron Radiat       Date:  2016-01-01       Impact factor: 2.616

4.  Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin.

Authors:  F Siewert; B Löchel; J Buchheim; F Eggenstein; A Firsov; G Gwalt; O Kutz; St Lemke; B Nelles; I Rudolph; F Schäfers; T Seliger; F Senf; A Sokolov; Ch Waberski; J Wolf; T Zeschke; I Zizak; R Follath; T Arnold; F Frost; F Pietag; A Erko
Journal:  J Synchrotron Radiat       Date:  2018-01-01       Impact factor: 2.616

5.  Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy.

Authors:  Qiushi Huang; Qi Jia; Jiangtao Feng; Hao Huang; Xiaowei Yang; Joerg Grenzer; Kai Huang; Shibing Zhang; Jiajie Lin; Hongyan Zhou; Tiangui You; Wenjie Yu; Stefan Facsko; Philippe Jonnard; Meiyi Wu; Angelo Giglia; Zhong Zhang; Zhi Liu; Zhanshan Wang; Xi Wang; Xin Ou
Journal:  Nat Commun       Date:  2019-06-04       Impact factor: 14.919

6.  Design and Fabrication of Silicon-Blazed Gratings for Near-Infrared Scanning Grating Micromirror.

Authors:  Sinong Zha; Dongling Li; Quan Wen; Ying Zhou; Haomiao Zhang
Journal:  Micromachines (Basel)       Date:  2022-06-25       Impact factor: 3.523

  6 in total

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