| Literature DB >> 20672044 |
Jifa Mei1, Junwan Li, Yushan Ni, Huatao Wang.
Abstract
The process of nanocontact including indentation and retraction between a large Ni tip and a Cu substrate is investigated using quasicontinuum (QC) method. The multiscale model reveals that significant plastic deformation occurs during the process of nanocontact between Ni tip and Cu substrate. Plastic deformation is observed in an area as large as 20 nm wide and 10 nm thick beneath Ni tip during the indentation and retraction. Also, plastic deformation at a deep position in the Cu substrate does not disappear after the neck failure. The analysis of generalized planar fault energy curve shows that there is a strong tendency for deformation twinning in Cu substrate. However, deformation twinning will be retarded during indentation due to the high stress intensity caused by stepped surface of Ni tip. The abrupt drop of load curve during tip retraction is attributed to the two different fracture mechanisms. One is atomic rearrangement near the interface of Ni tip and Cu substrate at the initial stage of neck fracture, the other is shear behavior of adjacent {111} planes at the necking point. A comparison of the critical load and critical contact radius for neck fracture is also made between theoretical values and our numerical results.Entities:
Keywords: Multiscale simulation; Nanocontact; Neck fracture; Quasicontinuum method
Year: 2010 PMID: 20672044 PMCID: PMC2894359 DOI: 10.1007/s11671-010-9533-1
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Figure 1Schematic representation of a naocontact model and b representative atoms near the interface
Figure 2Load–depth response curve for nanocontact
Figure 3Atomic configurations of Cu substrate during indentation process at different depth: aη = 0.0 nm, bη = 0.9 nm, cη = 1.38 nm and dη = 1.82 nm
Figure 4Atomic configurations of Cu substrate during the first part of retraction process at different depth: aη = 0.76 nm, bη = 0.1 nm
Figure 5Atomic configurations of Cu substrate during the second part of retraction process at different depth: aη = −1.56 nm, bη = −3.5 nm
Figure 6Generalized planar fault energy (GPF) curves of single crystal Cu, where a is equilibrium lattice parameter
Figure 7Two different types of fracture mechanisms during the neck fracture