Literature DB >> 20665567

High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation.

Paul Poodt1, Adriaan Lankhorst, Fred Roozeboom, Karel Spee, Diederik Maas, Ad Vermeer.   

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Year:  2010        PMID： 20665567     DOI： 10.1002/adma.201000766

Source DB:  PubMed          Journal:  Adv Mater        ISSN： 0935-9648            Impact factor:   30.849


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  8 in total

1.  The influence of process parameters and pulse ratio of precursors on the characteristics of La1 - x Al x O3 films deposited by atomic layer deposition.

Authors:  Chenxi Fei; Hongxia Liu; Xing Wang; Xiaojiao Fan
Journal:  Nanoscale Res Lett       Date:  2015-04-14       Impact factor: 4.703

2.  Investigation on the passivated Si/Al2O3 interface fabricated by non-vacuum spatial atomic layer deposition system.

Authors:  Shui-Yang Lien; Chih-Hsiang Yang; Kuei-Ching Wu; Chung-Yuan Kung
Journal:  Nanoscale Res Lett       Date:  2015-02-28       Impact factor: 4.703

3.  Plasmonic and silicon spherical nanoparticle antireflective coatings.

Authors:  K V Baryshnikova; M I Petrov; V E Babicheva; P A Belov
Journal:  Sci Rep       Date:  2016-03-01       Impact factor: 4.379

4.  Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage.

Authors:  Cao Guan; John Wang
Journal:  Adv Sci (Weinh)       Date:  2016-05-13       Impact factor: 16.806

5.  Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations.

Authors:  Elsa Alvaro; Angel Yanguas-Gil
Journal:  PLoS One       Date:  2018-01-10       Impact factor: 3.240

Review 6.  Surface modification and functionalization of powder materials by atomic layer deposition: a review.

Authors:  Yiyun Hu; Jian Lu; Hao Feng
Journal:  RSC Adv       Date:  2021-03-23       Impact factor: 3.361

7.  Enhanced efficiency of Cu2ZnSn(S,Se)4 solar cells via anti-reflectance properties and surface passivation by atomic layer deposited aluminum oxide.

Authors:  Bingye Zhang; Lu Han; Shitian Ying; Yongfeng Li; Bin Yao
Journal:  RSC Adv       Date:  2018-05-24       Impact factor: 3.361

8.  Improvement of carrier diffusion length in silicon nanowire arrays using atomic layer deposition.

Authors:  Shinya Kato; Yasuyoshi Kurokawa; Shinsuke Miyajima; Yuya Watanabe; Akira Yamada; Yoshimi Ohta; Yusuke Niwa; Masaki Hirota
Journal:  Nanoscale Res Lett       Date:  2013-08-23       Impact factor: 4.703
  8 in total

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