Literature DB >> 20430417

Technological variation in the earliest Oldowan from Gona, Afar, Ethiopia.

Dietrich Stout1, Sileshi Semaw, Michael J Rogers, Dominique Cauche.   

Abstract

Inter-site technological variation in the archaeological record is one of the richest potential sources of information about Plio-Pleistocene hominid behavior and evolution. However, appropriate methods for describing and comparing Oldowan assemblages have yet to be agreed upon, and interpretation of the early record remains highly controversial. Particularly salient is disagreement over whether the Oldowan is a single technological phenomenon or is more accurately divided into multiple regional and/or chronological traditions, perhaps including a less developed Pre-Oldowan phase in the late Pliocene. Some of this disagreement reflects theoretical and methodological differences between research traditions and some is more directly evidential. Here we present a framework for describing and interpreting Oldowan variation and apply it to three Pliocene assemblages (EG-10, EG-12, and OGS-7) from Gona, all dated to c. 2.6 million years (Ma). Results indicate proficient knapping and a full range of Oldowan reduction strategies in these earliest known occurrences, consistent with the idea of an Oldowan "technological stasis" from 2.6-1.6 Ma. Patterns of variation in raw material selection and predominant reduction strategy at each site clearly indicate the importance of cultural transmission in the Oldowan, but confounding ecological and economic variation continue to render interpretation in terms of multiple tool making traditions or species inappropriate. We propose that cultural transmission and ecological adaptation should be recognized as complementary, rather than mutually exclusive, mechanisms in future attempts to explain Oldowan technological variation. Copyright 2010 Elsevier Ltd. All rights reserved.

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Year:  2010        PMID: 20430417     DOI: 10.1016/j.jhevol.2010.02.005

Source DB:  PubMed          Journal:  J Hum Evol        ISSN: 0047-2484            Impact factor:   3.895


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