Literature DB >> 20389703

Deep and tapered silicon photonic crystals for achieving anti-reflection and enhanced absorption.

Yung-Jr Hung1, San-Liang Lee, Larry A Coldren.   

Abstract

Tapered silicon photonic crystals (PhCs) with smooth sidewalls are realized using a novel single-step deep reactive ion etching. The PhCs can significantly reduce the surface reflection over the wavelength range between the ultra-violet and near-infrared regions. From the measurements using a spectrophotometer and an angle-variable spectroscopic ellipsometer, the sub-wavelength periodic structure can provide a broad and angular-independent antireflective window in the visible region for the TE-polarized light. The PhCs with tapered rods can further reduce the reflection due to a gradually changed effective index. On the other hand, strong optical resonances for TM-mode can be found in this structure, which is mainly due to the existence of full photonic bandgaps inside the material. Such resonance can enhance the optical absorption inside the silicon PhCs due to its increased optical paths. With the help of both antireflective and absorption-enhanced characteristics in this structure, the PhCs can be used for various applications.

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Year:  2010        PMID: 20389703     DOI: 10.1364/OE.18.006841

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  3 in total

1.  A comparison of light-harvesting performance of silicon nanocones and nanowires for radial-junction solar cells.

Authors:  Yingfeng Li; Meicheng Li; Pengfei Fu; Ruike Li; Dandan Song; Chao Shen; Yan Zhao
Journal:  Sci Rep       Date:  2015-06-26       Impact factor: 4.379

2.  Silicon Nanostructures Produced by Modified MacEtch Method for Antireflective Si Surface.

Authors:  Stepan Nichkalo; Anatoly Druzhinin; Anatoliy Evtukh; Oleg Bratus'; Olga Steblova
Journal:  Nanoscale Res Lett       Date:  2017-02-10       Impact factor: 4.703

3.  CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single Mask.

Authors:  Lingkuan Meng; Jianfeng Gao; Xiaobin He; Junjie Li; Yayi Wei; Jiang Yan
Journal:  Nanoscale Res Lett       Date:  2015-08-26       Impact factor: 4.703

  3 in total

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